×

Vapor deposition of metal oxides, silicates and phosphates, and silicon dioxide

DC
  • US 7,507,848 B2
  • Filed: 08/08/2005
  • Issued: 03/24/2009
  • Est. Priority Date: 09/28/2000
  • Status: Expired due to Term
First Claim
Patent Images

1. A reagent for use in a thin film deposition process, the reagent comprising Hf(NEtMe)4.

View all claims
  • 2 Assignments
Timeline View
Assignment View
    ×
    ×