Reverse Optical Mastering for Data Storage Disk Replicas
First Claim
1. A molded replica disk comprising:
- a molded replica substrate including a first major surface and a second major surface, the first major surface including a surface pattern defined by lands and grooves,wherein the surface pattern defines a track pitch that is less than 425 nanometers,wherein tops of the lands define widths between 100 nanometers and 200 nanometers, andwherein the grooves define depths less than 120 nanometers and greater than 20 nanometers.
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Accused Products
Abstract
A data storage master disk and method of making a data storage master disk. The data storage disk master is for use in a data storage disk replication process. The data storage disk molding processes produces replica disks having a surface relief pattern with replica lands and replica grooves. The method includes providing a master substrate. The master substrate is at least partially covered with a layer of photosensitive material. A surface relief pattern having master lands and master grooves is recorded in the data storage disk master, including the steps of exposing and developing the photosensitive material is controlled to form master grooves extending down to a substrate interface between the master substrate and the layer of photosensitive material, such that the width of the master grooves at the substrate interface corresponds to a desired width of the replica lands.
67 Citations
13 Claims
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1. A molded replica disk comprising:
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a molded replica substrate including a first major surface and a second major surface, the first major surface including a surface pattern defined by lands and grooves, wherein the surface pattern defines a track pitch that is less than 425 nanometers, wherein tops of the lands define widths between 100 nanometers and 200 nanometers, and wherein the grooves define depths less than 120 nanometers and greater than 20 nanometers. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10)
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11. A molded replica disk comprising:
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a molded replica substrate including a first major surface and a second major surface, the first major surface including a surface pattern defined by lands and grooves, wherein the surface pattern defines a track pitch that is less than 425 nanometers, wherein tops of the lands define widths between 100 nanometers and 200 nanometers, and wherein the widths of the tops of the lands are greater than 25 percent of the track pitch. - View Dependent Claims (12, 13)
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Specification